Substrate-mediated effects in photothermal patterning of alkanethiol self-assembled monolayers with microfocused continuous-wave lasers

• Anja Schröter,
• Mark Kalus and
• Nils Hartmann

Beilstein J. Nanotechnol. 2012, 3, 65–74, doi:10.3762/bjnano.3.8

• substrate on the overall patterning process and provide new perspectives in photothermal laser patterning of ultrathin organic coatings. Keywords: femtosecond lasers; nonlinear laser processing; self-assembled monolayers; subwavelength patterning; ultrathin resists; Introduction In the past decades, self

• , addressed here, considers the application of SAMs as ultrathin resists. Patterning techniques, such as scanning-probe techniques, e-beam lithography, micro-contact printing and photolithography have been employed along this path [6][7][8][9]. Furthermore, laser processing of SAMs has attracted significant